Silicon Carbide

CMP SLURRY – Silicon Carbide Wafer Slurry

Silicon Carbide stands as a testament to human ingenuity in synthesizing materials with extraordinary properties. Its combination of hardness, thermal conductivity, and semiconductor capabilities sets it apart, positioning SiC at the forefront of advanced

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Overview of CMP SLURRY – Silicon Carbide Wafer Slurry

Silicon Carbide (SiC), also known as carborundum, is a synthetic ceramic compound made up of silicon and carbon atoms. Known for its exceptional hardness, thermal conductivity, and resistance to chemical reactions and wear, SiC is a versatile material widely used in high-performance applications that demand superior physical and electronic properties. Its unique crystal structure, which can exist in several polytypes, contributes to its multifaceted utility across various industries.

Features of CMP SLURRY – Silicon Carbide Wafer Slurry

  1. Exceptional Hardness: Silicon carbide ranks just below diamond and boron carbide in hardness, making it an ideal abrasive material.

  2. High Thermal Conductivity: It is an excellent heat conductor, capable of dissipating heat rapidly, which is crucial for high-power electronic and semiconductor devices.

  3. Chemical Stability: Resistant to most acids, alkalis, and salt solutions, SiC maintains its properties even under harsh chemical environments.

  4. Wide Bandgap Semiconducting Material: As a wide bandgap semiconductor, it operates at higher temperatures and frequencies than conventional semiconductors like silicon.

  5. Mechanical Strength and Wear Resistance: Offers high mechanical strength and excellent wear resistance, suitable for mechanical seals, bearings, and pump components.

  6. Thermal Shock Resistance: Can withstand rapid temperature changes without cracking or degrading, important for applications involving cyclic heating and cooling.

CMP SLURRY - Silicon Carbide Wafer Slurry

(CMP SLURRY – Silicon Carbide Wafer Slurry)

Parameters of CMP SLURRY – Silicon Carbide Wafer Slurry

CMP SLURRY is a product used to remove metal oxides and impurities from silicon carbide (SiC) wafers during the production process of semiconductor devices. The CMP SLURRY parameters refer to the specific conditions under which the slurry works effectively in removing these contaminants.
The effectiveness of CMP SLURRY can be influenced by several factors, including the slurry concentration, temperature, and pH level. Generally speaking, a higher slurry concentration will result in better removal of contaminants, but it may also increase the amount of metal oxides present in the SiC wafer, which could negatively impact its properties. Similarly, a higher temperature will generally increase the rate of chemical reactions within the slurry, but it may also cause thermal stress on the SiC wafers.
The pH level of the slurry plays an important role in determining its effectiveness. For example, a solution with a higher pH will typically be more effective at removing acid-based contaminants, while a solution with a lower pH will be more effective at removing alkaline-based contaminants. It’s important to choose the appropriate pH for your specific application, as different types of contaminants require different pH levels for optimal removal.
In addition to these general parameters, there are also other specific parameters that may be relevant depending on the type of contaminants being removed and the desired outcome of the process. These may include the ratio of water to slurry, the size of the particles in the slurry, and the presence of any additives or chemicals used in the slurry. By carefully controlling these parameters, you can optimize the effectiveness of CMP SLURRY and improve the quality of your final product.

CMP SLURRY - Silicon Carbide Wafer Slurry

(CMP SLURRY – Silicon Carbide Wafer Slurry)

Applications of CMP SLURRY – Silicon Carbide Wafer Slurry

  1. Semiconductor Devices: Used in high-voltage, high-frequency, and high-temperature power electronics, such as MOSFETs, Schottky diodes, and power modules.

  2. Abrasive Materials: As an abrasive grain in grinding wheels, sandpapers, and cutting tools due to its hardness and wear resistance.

  3. Refractories and Furnace Linings: In high-temperature furnaces and kilns because of its outstanding thermal stability and resistance to corrosion.

  4. Ceramic Armor: In lightweight armor systems due to its combination of hardness, toughness, and low density.

  5. Chemical Process Equipment: For pumps, valves, and seals in corrosive chemical environments where metals would corrode.

  6. Wire Sawing: As the abrasive medium in wire saws for slicing silicon wafers in the semiconductor industry and gemstones.

Company Profile

MyCarbides is a trusted global chemical material supplier & manufacturer with over 12-year-experience in providing super high-quality carbides and relative products.

The company has a professional technical department and Quality Supervision Department, a well-equipped laboratory, and equipped with advanced testing equipment and after-sales customer service center.

If you are looking for high-quality carbide materials and relative products, please feel free to contact us or click on the needed products to send an inquiry.

Payment Methods

L/C, T/T, Western Union, Paypal, Credit Card etc.


It could be shipped by sea, by air, or by reveal ASAP as soon as repayment receipt.

FAQs of CMP SLURRY – Silicon Carbide Wafer Slurry

Q: How is CMP SLURRY – Silicon Carbide Wafer Slurry produced?
A: CMP SLURRY – Silicon Carbide Wafer Slurry is primarily synthesized through the Acheson process, which involves heating a mixture of silica sand and carbon (usually in the form of coke) in an electric furnace at high temperatures.

Q: Is CMP SLURRY – Silicon Carbide Wafer Slurry conductive?
A: Yes, CMP SLURRY – Silicon Carbide Wafer Slurry is a semiconductor material with unique electronic properties, including high breakdown voltage and thermal conductivity, making it suitable for power electronics.

Q: Can CMP SLURRY – Silicon Carbide Wafer Slurry be used in extreme environments?
A: Absolutely, SiC’s high temperature stability, resistance to radiation damage, and ability to withstand thermal shocks make it ideal for applications in space, nuclear reactors, and deep-well drilling.

Q: What gives CMP SLURRY – Silicon Carbide Wafer Slurry its unique properties?
A: The covalent bond structure of CMP SLURRY – Silicon Carbide Wafer Slurry, along with its tight crystal lattice, contributes to its hardness, high melting point, and resistance to wear and corrosion.

Q: Is CMP SLURRY – Silicon Carbide Wafer Slurry biocompatible?
A: SCMP SLURRY – Silicon Carbide Wafer Slurry has been investigated for biomedical applications due to its biocompatibility, inertness, and durability, with potential uses in orthopedic implants and surgical instruments.

CMP SLURRY - Silicon Carbide Wafer Slurry

(CMP SLURRY – Silicon Carbide Wafer Slurry)

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